Capacitance Electrochemical pH Sensor Based on Different Hafnium Dioxide (HfO2) Thicknesses
نویسندگان
چکیده
Over the past years, to achieve better sensing performance, hafnium dioxide (HfO2) has been studied as an ion-sensitive layer. In this work, thin layers of were used pH-sensitive membranes and deposited by atomic layer deposition (ALD) process onto electrolytic-insulating-semiconductor structure Al/Si/SiO2/HfO2 for realization a pH sensor. The thicknesses HfO2 in work was 15, 19.5 39.9 nm. thickness controlled ALD during fabrication process. sensitivity toward H+ clearly higher when compared other interfering ions such potassium K+, lithium Li+, sodium Na+ ions. Mott?Schottky electrochemical impedance spectroscopy (EIS) analyses characterise investigate sensitivity. This recorded Mott–Schottky at 54.5, 51.1 49.2 mV/pH EIS 5.86 p[H?1], 10.63 12.72 p[H?1] 30 nm sensitive layer, respectively. developed sensor highly selective three thicknesses, nm, HfO2-sensitive previously mentioned interferences. However, performances with 15 technique, whilst analyses, sensors more thickness.
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ژورنال
عنوان ژورنال: Chemosensors
سال: 2021
ISSN: ['2227-9040']
DOI: https://doi.org/10.3390/chemosensors9010013